Characterization of ultrathin gate dielectrics by grazing X-ray reflectance and VUV spectroscopic ellipsometry on the same instrument
| Autor: | Pierre Boher, Jean Louis Stehle, Patrick Evrard, Jean Philippe Piel |
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| Rok vydání: | 2002 |
| Předmět: |
Materials science
business.industry X-ray Integrated circuit Dielectric Surface finish Condensed Matter Physics Electronic Optical and Magnetic Materials law.invention Characterization (materials science) Optics law Materials Chemistry Ceramics and Composites Spectroscopic ellipsometry Thin film business High-κ dielectric |
| Zdroj: | Journal of Non-Crystalline Solids. 303:167-174 |
| ISSN: | 0022-3093 |
| Popis: | Precise characterization of high k gate dielectrics becomes a challenging task due to the very thin thickness ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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