Development of a Novel Optical Variable Attenuator in Lithography Exposure System
| Autor: | 王丽 Wang Li, 董连和 Dong Lianhe, 李美萱 Li Meixuan |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Attenuator (electronics)
Materials science business.industry 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials 010309 optics 0103 physical sciences Optoelectronics Electrical and Electronic Engineering 0210 nano-technology business Lithography |
| Zdroj: | Chinese Journal of Lasers. 45:0103002 |
| ISSN: | 0258-7025 |
| DOI: | 10.3788/cjl201845.0103002 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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