The photoresist developing ability study at different contact angle and mask transmission rate

Autor:	Zheng Haichang, Chen Jiawen, Qin Lipeng, Yin Pengteng, Chen Lijun, Wang Xiaolong
Rok vydání:	2021
Předmět:	chemistry.chemical_classification Contact angle Materials science Pulmonary surfactant Resist chemistry Wafer Polymer Edge (geometry) Photoresist Composite material Layer (electronics)
Zdroj:	2021 China Semiconductor Technology International Conference (CSTIC).
DOI:	10.1109/cstic52283.2021.9461568
Popis:	The PFOA surfactant (chemical structure: (polymer backbone)-C8F17) using in photoresist is forbade own to every country need protect environment, so the PFOA surfactant is replaced by non PFOA type (chemical structure: (polymer)-(CF2) n2 -CF3, n2
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::55ed7849befcce9301189ad5df0aa0c5 https://doi.org/10.1109/cstic52283.2021.9461568 Zobrazit plný text záznamu