Effects of chemical state on quantitative AES of metal-sulfur compounds

Autor:	Richard W. Linton, D. P. Griffis
Rok vydání:	1984
Předmět:	Auger electron spectroscopy Chemistry Analytical chemistry Surfaces and Interfaces General Chemistry Electron Condensed Matter Physics Spectral line Surfaces Coatings and Films Auger Chemical state X-ray photoelectron spectroscopy Ionization Materials Chemistry Valence electron
Zdroj:	Surface and Interface Analysis. 6:15-20
ISSN:	1096-9918 0142-2421
DOI:	10.1002/sia.740060103
Popis:	A quantitative approach to AES is illustrated for various metal–sulfur compounds involving: (a) intensity measurements via integral areas of background subtracted N(E) spectra (including sample probe potential biasing to improve background subtraction); (b) low primary electron dose, pulse-count spectrum acquisition to minimize primary electron beam damage and charging artifacts; (c) corrections to spectral intensity for variations in electron backscattering and inelastic Auger electron mean free path for each metal–sulfur compound matrix; (d) XPS quantitative analysis to correct for differences in surface vs. bulk stoichiometries. Although the above approach results in improved analytical precisions, a residual difference of greater than a factor of 2 remains in the Auger elemental sensitivity factor for sulfur (LMM) in corresponding metal sulfate vs. sulfide compounds. This suggests a chemical state dependent Auger electron yield (core level ionization cross section times the Auger transition probability). Accurate AES quantification, therefore, may require chemical state specific sensitivity factors, particularly for valence shell transitions.
Databáze:	OpenAIRE
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