An Overview of Current Trends in Hafnium Oxide–Based Resistive Memory Devices

Autor: Lalit Kumar Lata, Praveen Kumar Jain, Abhinandan Jain, Deepak Bhatia
Rok vydání: 2022
Zdroj: Nanotechnology ISBN: 9781003220350
DOI: 10.1201/9781003220350-1
Databáze: OpenAIRE