Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications

Autor:	R.S. Zhai, Tzyy-Jiann Wang, Hsuen-Li Chen, F.H. Ko, T.J. Chuang, Wonder Fan, C.K. Hsu
Rok vydání:	2004
Předmět:	Materials science business.industry Extreme ultraviolet lithography law.invention chemistry.chemical_compound Anti-reflective coating Silicon nitride chemistry law Oxygen plasma Optoelectronics X-ray lithography Photolithography business
Zdroj:	CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671).
DOI:	10.1109/cleopr.2003.1277241
Popis:	We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::55c8ae1977e52de11d4456f31fb769e2 https://doi.org/10.1109/cleopr.2003.1277241 Zobrazit plný text záznamu