Amorphous TiOxFilms Prepared by Cold Plasma Technique
Autor: | S. Narksitipan |
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Rok vydání: | 2013 |
Předmět: | |
Zdroj: | Ferroelectrics. 456:113-119 |
ISSN: | 1563-5112 0015-0193 |
DOI: | 10.1080/00150193.2013.846678 |
Popis: | TiOx thin films have been prepared on glasses by using nitrogen cold-plasma was induced by high electrical field and frequency, which deposited on the films surface at 450–550°C for 20 min, and the effect of temperature on the crystallinity, chemical compositions, morphology and optical properties were studied through XRD, EDS, SEM and UV-Vis spectrophotometer, respectively. The films were amorphous. SEM images have shown the films consist of rods shape, which were agglomerated and arrange in a porous microstructure. The optical transmittance of the films responded in the UV region and shifted to shorter wavelength as increasing temperature. |
Databáze: | OpenAIRE |
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