Amorphous TiOxFilms Prepared by Cold Plasma Technique

Autor: S. Narksitipan
Rok vydání: 2013
Předmět:
Zdroj: Ferroelectrics. 456:113-119
ISSN: 1563-5112
0015-0193
DOI: 10.1080/00150193.2013.846678
Popis: TiOx thin films have been prepared on glasses by using nitrogen cold-plasma was induced by high electrical field and frequency, which deposited on the films surface at 450–550°C for 20 min, and the effect of temperature on the crystallinity, chemical compositions, morphology and optical properties were studied through XRD, EDS, SEM and UV-Vis spectrophotometer, respectively. The films were amorphous. SEM images have shown the films consist of rods shape, which were agglomerated and arrange in a porous microstructure. The optical transmittance of the films responded in the UV region and shifted to shorter wavelength as increasing temperature.
Databáze: OpenAIRE