Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD

Autor:	Ji Won Han, Hyun Soo Jin, Yoon Jeong Kim, Ji Sun Heo, Woo-Hee Kim, Ji-Hoon Ahn, Tae Joo Park
Rok vydání:	2023
Předmět:	Materials Chemistry General Chemistry
Zdroj:	Journal of Materials Chemistry C. 11:3743-3750
ISSN:	2050-7534 2050-7526
Popis:	Electric-potential-assisted atomic layer deposition was demonstrated for Ru film growth. Surface reaction was modified via the electric potential, which affected the nucleation and microstructure of films. Assorted film properties were improved notably.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5591f0a7472d763d91567c8f18d5a07f https://doi.org/10.1039/d2tc04755a Zobrazit plný text záznamu