Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field

Autor:	Hajime Mori, Satoshi Nakagawa, Tomoyuki Sasaki, Takashi Namura
Rok vydání:	1994
Předmět:	Silicon business.industry Plasma electron General Engineering General Physics and Astronomy chemistry.chemical_element Plasma Molecular physics Magnetic field Dipole Optics chemistry Physics::Plasma Physics Magnet Electron flow Reactive-ion etching business
Zdroj:	Japanese Journal of Applied Physics. 33:2194
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.33.2194
Popis:	The effectiveness of a curved lateral magnetic field has been examined in magnetically enhanced reactive ion etching (MERIE). It is demonstrated that both charge build-up and etching nonuniformity are suppressed at the same time when the offset angle of dipole magnets is adjusted to 10°. Theoretical analysis of electron flow in the curved lateral magnetic field suggests that the plasma electron multiplication effect along E×B drift motion is compensated by the divergence of the drift motion at the optimum condition, and it results in uniform plasma generation. Although the definite mechanism of charge build-up is still not clear, this study indicates the importance of plasma uniformity in controlling the charge build-up in a MERIE system.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5549d5d69bfffaf7b1cc76831e30c426 https://doi.org/10.1143/jjap.33.2194 Zobrazit plný text záznamu