Fast full-chip curvilinear ILT mask generation with machine learning technology
| Autor: | Yuangsheng Ma, Rui Wu, Junjiang Lei, Le Hong, Keisuke Mizuuchi, Fan Jiang, Alexander Tritchkov, Yuyang Sun |
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| Rok vydání: | 2022 |
| Zdroj: | DTCO and Computational Patterning. |
| Databáze: | OpenAIRE |
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