Breakdown of thin films ?cured? with tantalum oxide

Autor:	V. I. Brekhunov, V. V. Motoshkin, V. A. Mukhachev
Rok vydání:	1977
Předmět:	Materials science genetic structures Aluminum electrode Thermal breakdown General Physics and Astronomy Tantalum oxide Thin film Composite material Curing (chemistry)
Zdroj:	Soviet Physics Journal. 20:523-526
ISSN:	1573-9228 0038-5697
Popis:	Studies have been made of the temperature and time characteristics of breakdown in a thin Ta2O5 film produced by reactive evaporation with subsequent “curing” of the defect sites, with aluminum electrodes. The data obtained are explained from the viewpoint of classical thermal breakdown.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::552ce63ebfc8c44ed07ca142445b288c https://doi.org/10.1007/bf01207702 Zobrazit plný text záznamu Full text from SpringerLink