Breakdown of thin films ?cured? with tantalum oxide
Autor: | V. I. Brekhunov, V. V. Motoshkin, V. A. Mukhachev |
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Rok vydání: | 1977 |
Předmět: | |
Zdroj: | Soviet Physics Journal. 20:523-526 |
ISSN: | 1573-9228 0038-5697 |
Popis: | Studies have been made of the temperature and time characteristics of breakdown in a thin Ta2O5 film produced by reactive evaporation with subsequent “curing” of the defect sites, with aluminum electrodes. The data obtained are explained from the viewpoint of classical thermal breakdown. |
Databáze: | OpenAIRE |
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