Effectiveness of ion cleaning to improve the laser damage threshold of HfO2/SiO2optical coatings for high reflection and antireflection at 527 nm and 1054 nm
| Autor: | John C. Bellum, Ella Suzanne Field, Damon E. Kletecka |
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| Rok vydání: | 2016 |
| Předmět: |
Cleaning agent
Argon Materials science business.industry chemistry.chemical_element 02 engineering and technology Substrate (electronics) Laser 01 natural sciences Evaporation (deposition) Ion source Ion law.invention 010309 optics 020210 optoelectronics & photonics Optical coating Optics chemistry law 0103 physical sciences 0202 electrical engineering electronic engineering information engineering Optoelectronics business |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| Popis: | Preventing contamination is vital to achieving high laser-induced damage thresholds in optical coatings. The importance of removing contamination from optical substrates has led to the development of many specialized cleaning processes, including the application of solvents, acids, mild detergents, and abrasives. To further enhance contamination removal, the substrate may be treated with ion cleaning just prior to depositing the optical coating. Ion cleaning is attractive thanks to the convenience of providing in-situ treatment to optical substrates, and also avoiding the hassle of managing hazardous chemicals or applying mechanical force to scrub off detergents and other cleaning agents. In this study, we compare the effectiveness of ion cleaning for increasing the laser-induced damage thresholds of high reflection (527 nm and 1054 nm) and antireflection (527 nm) coatings. Ion cleaning was performed using a radio frequency ion source with argon and oxygen. The coatings investigated were deposited with layers of HfO 2 and SiO 2 in an e-beam evaporation system, and are designed to withstand nanosecond pulses from a kJ-class laser. |
| Databáze: | OpenAIRE |
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