| Autor: |
Min-Chun Tsai, Jinyu Zhang, Yan Wang, Zhiping Yu, Wei Xiong |
| Rok vydání: |
2009 |
| Předmět: |
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| Zdroj: |
Tsinghua Science and Technology. 14:68-74 |
| ISSN: |
1007-0214 |
| DOI: |
10.1016/s1007-0214(09)70009-4 |
| Popis: |
As mask features scale to smaller dimensions, the so-called “3-D mask effects” which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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