Cold Atmospheric Pressure Plasma VUV Interactions With Surfaces: Effect of Local Gas Environment and Source Design
| Autor: | Peter Bruggeman, Pingshan Luan, Andrew J. Knoll, Elliot A. J. Bartis, Gottlieb S. Oehrlein, V. S.S.K. Kondeti |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
chemistry.chemical_classification Argon Polymers and Plastics Analytical chemistry Noble gas chemistry.chemical_element Atmospheric-pressure plasma 02 engineering and technology Polymer Photoresist 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Oxygen chemistry 0103 physical sciences Surface modification 0210 nano-technology Optical filter |
| Zdroj: | Plasma Processes and Polymers. 13:1069-1079 |
| ISSN: | 1612-8869 1612-8850 |
| Popis: | This study uses photoresist materials in combination with several optical filters as a diagnostic to examine the relative importance of VUV-induced surface modifications for different cold atmospheric pressure plasma (CAPP) sources. The argon fed kHz-driven ring-APPJ showed the largest ratio of VUV surface modification relative to the total modification introduced, whereas the MHz APPJ showed the largest overall surface modification. The MHz APPJ shows increased total thickness reduction and reduced VUV effect as oxygen is added to the feed gas, a condition that is often used for practical applications. We examine the influence of noble gas flow from the APPJ on the local environment. The local environment has a decisive impact on polymer modification from VUV emission as O2 readily absorbs VUV photons. |
| Databáze: | OpenAIRE |
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