Modification of thermally reduced graphene oxide by the SF6/Ar plasma treatment
| Autor: | M. V. Nogovitcyna, V. I. Popov, E P Neustroev, V. B. Timofeev |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
Graphene Scanning electron microscope General Engineering Oxide Analytical chemistry Energy-dispersive X-ray spectroscopy chemistry.chemical_element 02 engineering and technology Plasma 021001 nanoscience & nanotechnology 01 natural sciences law.invention chemistry.chemical_compound symbols.namesake chemistry law 0103 physical sciences Fluorine symbols Surface modification General Materials Science 010306 general physics 0210 nano-technology Raman spectroscopy |
| Zdroj: | Inorganic Materials: Applied Research. 8:763-768 |
| ISSN: | 2075-115X 2075-1133 |
| DOI: | 10.1134/s2075113317050215 |
| Popis: | The effect of SF6/Ar plasma on the properties of partially thermally reduced graphene oxide (GO) was studied by Raman spectroscopy, scanning electron microscopy, X-ray energy dispersive spectroscopy, and the current–voltage characteristics. Samples were treated by SF6/Ar plasma for up to 45 min at the power of 100–250 W. The fluorine content and the resistance of samples depending on the time of treatment were determined. It was established that the fluorine content in GO was more than 20 wt % if the treatment time was 45 min. It was shown that the sharpest change in the resistance occurred during the initial plasma treatment. In the subsequent processing, there was a gradual increase in the resistance, whose value varied slightly during the heat treatment at up to 450°C. No noticeable increase in defects on the surface of graphene oxide after plasma treatment was detected by Raman spectroscopy and electron microscopy. The fluorination in SF6/Ar plasma was explained by the formation of C–F bonds with the structure of graphene oxide. |
| Databáze: | OpenAIRE |
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