| Autor: |
D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, R. N. Shagam, W. C. Sweatt, T. G. Smith, O. R. Wood, A. A. MacDowell, J. E. Bjorkholm, T. E. Jewell, F. Zernike, B. L. Fix, H. W. Hauschildt |
| Rok vydání: |
1996 |
| Zdroj: |
Extreme Ultraviolet Lithography (TOPS). |
| DOI: |
10.1364/eul.1996.eww2 |
| Popis: |
An extreme ultraviolet (EUV) ring-field camera, comprised of 3 aspheric mirrors, has been fabricated and evaluated using visible light. The wavefront error (WFE) within a 1 mm × 25 mm field of view is 2.5 nm RMS. In a 10x Schwarzschild optic, having a 0.4 mm diameter field of view, an optically measured WFE of 1 nm RMS has been achieved. EUV images recorded in resist using the Schwarzschild camera are shown. The integration of this camera into a laboratory tool for device fabrication experiments is described. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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