Dependence of pyrocarbon microstructure on the substrate and annealing during the initial stage of chemical vapor deposition

Autor:	Reinhard Schneider, X.L. Wang, J. Hawecker, W. Send, V. De Pauw, Dagmar Gerthsen
Rok vydání:	2008
Předmět:	Materials science Chemical engineering Annealing (metallurgy) Nucleation Surface roughness General Materials Science Wafer General Chemistry Pyrolytic carbon Chemical vapor deposition Microstructure Deposition (law)
Zdroj:	Carbon. 46:236-244
ISSN:	0008-6223
Popis:	Electron microscopic and electron spectroscopic techniques were applied to study interface properties, microstructure and texture of pyrolytic carbon obtained after short-time chemical vapor deposition (CVD) on planar Si substrates. The pyrolytic carbon was obtained in a hot-wall reactor from methane at a total pressure of 20 kPa and temperature of 1100 °C. Only short depositions between 2.5 and 240 min were performed. The carbon deposition starts with the nucleation of isolated islands. The increase of residence and deposition time leads to the formation of a continuous layer by larger island sizes and higher island densities, a transition from rough to smooth surfaces and formation of pores on smooth surfaces. An increased deposition rate during the first 15 min is observed which is correlated with a granular morphology of the carbon layer. Using BN-covered Si wafers with a surface roughness on a 100 nm scale reduces the texture degree in the vicinity of the interface and strengthens adhesion of the pyrolytic carbon compared to the smooth Si substrate. The texture of high-textured pyrolytic carbon is improved significantly by annealing at 1100 °C.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::547409a3ab81313da5c09c2050c1fb5f https://doi.org/10.1016/j.carbon.2007.11.009 Zobrazit plný text záznamu Full Text from ScienceDirect