Origin of dielectric loss induced by oxygen plasma on organo-silicate glass low-k dielectrics

Autor:	J. Bao, Ryan Scott Smith, Michael L. McSwiney, Mansour Moinpour, Paul S. Ho, Hualiang Shi, Grant M. Kloster, Haiyu Harry Huang, Junjun Liu
Rok vydání:	2008
Předmět:	Permittivity Polarization density Dipole Kramers–Kronig relations Physics and Astronomy (miscellaneous) Ellipsometry Chemistry Analytical chemistry Physics::Optics Dielectric loss Dielectric Molecular physics Dielectric spectroscopy
Zdroj:	Applied Physics Letters. 93:192909
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.3026528
Popis:	This study investigated the origin of dielectric loss induced by O2 plasma on organo-silicate glass low-k dielectrics. The contributions from the polarization components to dielectric constant were delineated by analyzing the results from capacitance-voltage measurement, spectroscopic ellipsometry, and Fourier transform infrared spectroscopy together with the Kramers–Kronig dispersion relation. The dielectric loss was found to be dominated by the dipole contribution, compared with the electronic and ionic polarizations. The origin of the dipole contribution was further investigated by performing quantum chemistry calculations. The physisorbed water molecules were found to be primarily responsible for the dipole moment increase and the dielectric loss.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5444fe2c699bf539c6005fad72aa2946 https://doi.org/10.1063/1.3026528 Zobrazit plný text záznamu