Photodesorption of NO from chemically modified Ni(111) surfaces

Autor:	Xingcai Guo, John T. Yates, Jun Yoshinobu
Rok vydání:	1990
Předmět:	Chemistry Thermal desorption spectroscopy Analytical chemistry Thermal desorption General Physics and Astronomy chemistry.chemical_element Photon energy Oxygen Metal Nickel Adsorption Chemisorption visual_art visual_art.visual_art_medium Physical and Theoretical Chemistry
Zdroj:	The Journal of Chemical Physics. 92:7700-7707
ISSN:	1089-7690 0021-9606
Popis:	NO photodesorption from the oxygen‐covered, oxidized, and sulfur‐saturated Ni(111) surfaces was studied. Temperature programmed desorption effectively discriminates between NO species adsorbed on Ni metal sites and on Ni sites modified by O or S, making the study of photodesorption from each site possible. Oxygen‐ and sulfur‐modified Ni(111) surfaces both exhibit enhanced photodesorption cross sections compared to a clean Ni surface. Both the direct observation of NO(g) photodesorption and postirradiation thermal desorption measurements of NO coverage have been carried out. The photodesorption process is first order in photon flux and in NO coverage within a given chemisorption state. The photon‐energy dependence of the NO photodesorption cross section from oxidized and S‐saturated Ni(111) surfaces was measured in detail over a photon energy range of 1.5–3.8 eV. For both oxidized and sulfur‐saturated Ni(111), the threshold for NO photodesorption is ∼1.5 eV. In addition, the photodesorption cross sections ...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::53bff2b7e94ac7551d0ba2ca10166a6d https://doi.org/10.1063/1.458156 Zobrazit plný text záznamu