Effect of O2/Ni ratio on structure and surface morphology of atmospheric pressure MOCVD grown NiO thin films

Autor: Motohiko Nakamura, Teuku Muhammad Roffi, Shinji Nozaki, Kazuo Uchida
Rok vydání: 2013
Předmět:
Zdroj: MRS Proceedings. 1577
ISSN: 1946-4274
0272-9172
DOI: 10.1557/opl.2013.651
Popis: Effect of oxygen to nickel molar ratio (O2/Ni) on the crystallinity of atmospheric pressure metal organic chemical vapor deposition (APMOCVD) grown NiO at 500°C is reported. X-ray diffraction (XRD) analysis including grazing incident angle θ of 0.6°, θ-2θ, ɸ and rocking curve scan are employed for crystallographic characterization. Furthermore, surface roughness is studied by atomic force microscopy (AFM). No evidence of diffraction peaks in X-ray grazing incident angle measurement confirms that all the grown NiO films are well oriented along a certain direction. θ-2θ scan results further indicate that the samples are highly oriented only along [111] direction on (0001) sapphire substrates. The analysis of full width at half maximum (FWHM) of rocking curve scan of (111) plane shows that higher O2/Ni ratio results in better crystallinity. The best crystallinity is achieved with FWHM as low as 0.106° at (111) rocking curve scan corresponding to 82.57nm grain size. AFM measurement shows that NiO films grown with higher O2/Ni ratio have smoother surface morphology.
Databáze: OpenAIRE
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