Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N+Ion Implantation
| Autor: | Haider A. Shukur, Mitsunobu Sato, Ichiro Takano, Isao Nakamura |
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| Rok vydání: | 2012 |
| Předmět: | |
| Zdroj: | Advances in Materials Science and Engineering. 2012:1-7 |
| ISSN: | 1687-8442 1687-8434 |
| Popis: | TiO2thin films of a rutile, an anatase, and a mixture type with anatase and rutile were fabricated by a magnetron sputtering method. The fabricated films were irradiated by N+ions with several doses using the Freeman ion source. Atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and UV-VIS spectrophotometer were employed to investigate morphology, structure, chemical state, and optical characteristics, respectively. Photocatalytic activity was evaluated by degradation of a methylene blue solution using UV and visible light. TiO2thin films with each structure irradiated by N+ions showed the different N concentration in the same N+ion dose and the chemical state of XPS results suggested that an O atom in TiO2lattice replaced by an N atom. Therefore the photocatalytic activity of TiO2thin films was improved under visible light. The maximum photocatalytic activity of TiO2thin films with each structure was indicated at N concentration of 2.1% for a rutile type, of 1.0% for an anatase type, and of 3.8% for a mixture type under the condition of ions/cm2in N+ion dose. |
| Databáze: | OpenAIRE |
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