Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)
| Autor: | N. Nomura, M. Sasago, S. Tomida, Yoshihiko Hirai, M. Endo, S. Hayama, K. Ikeda |
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| Rok vydání: | 1991 |
| Předmět: |
Engineering
business.industry Computation Process (computing) Supercomputer Computer Graphics and Computer-Aided Design Characterization (materials science) law.invention Computer engineering Resist law Electrical and Electronic Engineering Photolithography business Lithography Software Simulation Electron-beam lithography |
| Zdroj: | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 10:802-807 |
| ISSN: | 0278-0070 |
| Popis: | A three-dimensional topographical simulator PEACE (photo and electron beam lithography analyzing computer engineering system) is discussed. One of the difficulties in resist topographical simulation exists due to the three-dimensional resist development algorithm. An algorithm based on the cell removal model provides accurate and stable results for the three-dimensional resist development process. The program has been adapted to a supercomputer for quick computation. The simulator can successfully perform the three-dimensional development in an absolutely stable manner, and good agreement can be obtained with experiments for both photo and electron beam lithography. > |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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