| Autor: |
M. Rudolph, H. W. P. Koops, J. Kretz, Markus Weber |
| Rok vydání: |
1994 |
| Předmět: |
|
| Zdroj: |
NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies ISBN: 9789048143887 |
| DOI: |
10.1007/978-94-015-8261-2_10 |
| Popis: |
Electron beam induced deposition from organic and metalorganic precursors allows to generate two and three-dimensional patterns and structures. Using a very fine electron beam in a dedicated field emission scanning electron microscope renders nanometer size deposits which extend from surfaces to heights in the micrometer range. Having an image processor attached to the microscope gives the capability to control the two- and three-dimensional deposition of material. Selecting special speed rates for the motion of the beam generates inclined deposits even at a 90 degree beam landing angle. Combining a tilted sample and the two dimensional way of structuring renders three dimensional structures. These nanostructures have very special characteristics according to resistivity and shape. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
