Processing and yield of Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7-x/ thin films and devices produced with a BaF/sub 2/ process

Autor:	P. Merchant, F.H. Garzon, J.G. Berry, J. Amano, Charles Wilker, R.J. Small, R.C. Taber, I. Raistrick, A.L. Matthews, Daniel B. Laubacher, D.W. Face
Rok vydání:	1991
Předmět:	High-temperature superconductivity Fabrication Materials science Analytical chemistry Evaporation (deposition) Electronic Optical and Magnetic Materials law.invention law Sputtering Etching Electrical and Electronic Engineering Thin film Deposition (law) Microwave
Zdroj:	IEEE Transactions on Magnetics. 27:1418-1421
ISSN:	1941-0069 0018-9464
Popis:	High-quality films were produced by coevaporation and cosputtering of Y, Cu, and BaF/sub 2/ followed by an ex-situ anneal. The Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7-x/ films produced had microwave surface resistances as low as 1/10 that of Cu at 77 K and 10 GHz. This process is especially useful for producing uniform films over areas larger than 1 in/sup 2/ and is compatible with lift-off or traditional etch patterning processes for fabrication of microwave devices. More than 100 films have been deposited on
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5319aa5902b43235cdf7a6672d0edb50 https://doi.org/10.1109/20.133978 Zobrazit plný text záznamu