A hybrid exposure concept for lithography-based additive manufacturing
| Autor: | Bernhard Steyrer, Jürgen Stampfl, Rafael Reiter, Bernhard Busetti, Bernhard Lutzer |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science business.industry Biomedical Engineering 02 engineering and technology 021001 nanoscience & nanotechnology Dichroic glass 01 natural sciences Industrial and Manufacturing Engineering Optics Contour line 0103 physical sciences Perpendicular Light beam General Materials Science Digital Light Processing 0210 nano-technology business Engineering (miscellaneous) Lithography Laser beams Light exposure |
| Zdroj: | Additive Manufacturing. 21:413-421 |
| ISSN: | 2214-8604 |
| DOI: | 10.1016/j.addma.2018.03.024 |
| Popis: | Lithography-based Additive Manufacturing Technologies (L-AMT) exploit the curing of photosensitive materials upon light exposure. We developed a hybrid exposure concept. This system is able to overcome the challenge of providing good surface qualities and excellent feature resolution as well as a throughput similar to dynamic mask-based L-AMT systems by combining two light sources. A Digital Light Processing (DLP®) Light Engine (LE) with a building area of 144 x 90 mm² offers a pixelsize of 56 μm. In order to further improve the achievable resolution, a continuous laser-exposed contour line (spot size 20 μm) on the outside of the projected envelope can be written with an additional scanning laser-system. The matching of the DLP® projection mask and the laser-contour is crucial for accurate printing. Therefore a calibration tool was developed, which facilitates the alignment of the two light sources. A dichroic coated mirror enables a perpendicular alignment of the DLP® light beam and the laser beam. |
| Databáze: | OpenAIRE |
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