Effects of different partition depths on heat and oxygen transport during continuous Czochralski (CCz) silicon crystal growth

Autor: Thi-Hoai-Thu Nguyen, Jyh-Chen Chen, Shih-Chi Lo
Rok vydání: 2022
Předmět:
Zdroj: Journal of Crystal Growth. 583:126546
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2022.126546
Databáze: OpenAIRE