Effects of different partition depths on heat and oxygen transport during continuous Czochralski (CCz) silicon crystal growth
Autor: | Thi-Hoai-Thu Nguyen, Jyh-Chen Chen, Shih-Chi Lo |
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Rok vydání: | 2022 |
Předmět: | |
Zdroj: | Journal of Crystal Growth. 583:126546 |
ISSN: | 0022-0248 |
DOI: | 10.1016/j.jcrysgro.2022.126546 |
Databáze: | OpenAIRE |
Externí odkaz: |