Optima MD: Mid-Dose, Hybrid-Scan Ion Implanter

Autor:	R.D. Rathmell, Bo H. Vanderberg, Andrew Marlow Ray, K. W. Wenzel
Rok vydání:	2006
Předmět:	Secondary ion mass spectrometry Range (particle radiation) Engineering Optics Ion implantation Beamline business.industry Electrical engineering Process control business Space charge Beam (structure) Rotational energy
Zdroj:	AIP Conference Proceedings.
ISSN:	0094-243X
DOI:	10.1063/1.2401598
Popis:	The emergence of higher‐dose and lower‐energy halo and source‐drain extension implants for 90 and 65‐nm nodes drove the design of Axcelis’ Optima MD ion implanter. The Optima MD extends the proven process performance of traditional medium‐current implanters over an energy range of 1 keV to 250 keV for singly‐charged ion species with beam currents ranging from 1 pμA to 4800 pμA. The Optima MD comprises a hybrid‐scan beamline architecture, a new endstation, and a new control system that offers the user more flexibility in data acquisition and statistical process control. The beamline has the capability to provide milliamp beam currents in the low energy (
Databáze:	OpenAIRE
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