Study of pressure and proportion influence on the non-LTE plasma composition

Autor:	B. Liani, Rafik Benallal, A. Boudghene Stambouli
Rok vydání:	2006
Předmět:	Work (thermodynamics) Range (particle radiation) Argon chemistry Abundance (chemistry) Plasma composition Analytical chemistry Electron temperature chemistry.chemical_element Physical and Theoretical Chemistry Condensed Matter Physics Biochemistry Chemical composition
Zdroj:	Journal of Molecular Structure: THEOCHEM. 777:121-124
ISSN:	0166-1280
Popis:	In this paper, we use our model with 4T [Modelling of a multi-temperature plasma composition, Chin. Phys. Lett. 22(12) (2005) 3119] to calculate the chemical composition of CH4–Ar. This work is devoted to a study of the effect of the pressure and the Argon abundance on the mixture of non-LTE plasma composition. In other words, to evaluate the pressure and proportion influence on the density of the various species. The electron temperature Te varies in the range 5000–30,000 K.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::523d770a719d14ae7f7cd3ca1c2e046c https://doi.org/10.1016/j.theochem.2006.08.006 Zobrazit plný text záznamu Full Text from ScienceDirect