Novel route for the production of X-ray masks from a range of organometallic films
| Autor: | Ric M. Allott, I. C. E. Turcu, N. Spencer, Waseem Shaikh, M. R. Davidson, B. Lawrenson, J. Thomson, Alexander G. Fitzgerald, Nobuyuki Takeyasu, G. J. Berry, J. A. Cairns |
|---|---|
| Rok vydání: | 1998 |
| Předmět: |
Materials science
business.industry Extreme ultraviolet lithography chemistry.chemical_element Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Etching Electron beam processing Optoelectronics X-ray lithography Electrical and Electronic Engineering Photomask Platinum business Group 2 organometallic chemistry Palladium |
| Zdroj: | Microelectronic Engineering. :279-282 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(98)00064-1 |
| Popis: | The majority of commercial photomasks and X-ray masks produced at present are manufactured by a multi-step process which involves the use of etching. This route imposes a limitation on the resolution that can be achieved. We describe here a new approach which utilises a recently synthesised range of organometallic compounds designed to undergo direct conversion to metal under the influence of electron beam irradiation. This opens up the prospect of a novel route for the production of both X-ray masks and EUV masks in essentially a single processing step. The attainable resolution is better than 300nm, since the process involves the direct deposition of metal atoms under the influence of a focused electron beam. The method is very versatile in that a whole range of metals and metal alloys can be deposited, e.g. gold, platinum and palladium and their corresponding alloys. We describe here the production of a gold X-ray mask, which was used in conjunction with a compact laser plasma source. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect