Doping optimization and surface modification of aluminum doped zinc oxide films as transparent conductive coating
| Autor: | Chitra Agashe, Darshana Y. Inamdar, Pratibha Kadam, Shailaja Mahamuni |
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| Rok vydání: | 2012 |
| Předmět: |
Materials science
Inorganic chemistry Doping Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Zinc Isotropic etching Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Chemical engineering Etching (microfabrication) Materials Chemistry Surface roughness Surface modification Atomic ratio Transparent conducting film |
| Zdroj: | Thin Solid Films. 520:3871-3877 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2012.01.019 |
| Popis: | Aluminum doped zinc oxide (ZnO:Al) films were grown using spray pyrolysis technique. Effect of doping on structural, electrical, optical and morphological properties was studied. Aluminum doping improved the prominence of [002] growth while maintaining the grain size ~ 48 nm. Using an intermediate Al/Zn atomic ratio in precursor (1.5:100), we could achieve a low resistivity ρ ~ 7 × 10 − 4 Ωcm. These films possessed an average visible transmittance ~ 88%, an optical gap ~ 3.7 eV and plasma wavelength at 1.87 μm. A simultaneous use of methanol and iso-propanol in the precursor lead to a moderate surface roughness ~ 12 nm. The films were surface modified using wet chemical etching in diluted hydrochloric acid, for varied time intervals (5 s–15 s) and etchant concentrations (0.125%–1%). The etching experiments could be used to know the building of the film as also to modify the surface for desired optical and morphological properties. |
| Databáze: | OpenAIRE |
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