Surface evolution and dynamic scaling of sputter-deposited Al thin films on Ti(1 0 0) substrates
| Autor: | T. Fu, Zengtao Liu, Yaogen Shen, L.P. He |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
Surface (mathematics)
Materials science Morphology (linguistics) business.industry General Physics and Astronomy Surfaces and Interfaces General Chemistry Substrate (electronics) Surface finish Condensed Matter Physics Surfaces Coatings and Films Optics Sputtering Surface roughness Exponent Composite material Thin film business |
| Zdroj: | Applied Surface Science. 226:371-377 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2003.10.049 |
| Popis: | The surface morphology and dynamic scaling behavior of Al thin films sputter-deposited on rough Ti(1 0 0) substrates were studied by atomic force microscopy (AFM). It was found that the rough Ti(1 0 0) substrates played a crucial role in determining the surface morphology and roughness evolution of Al thin films at the initial stage of the film growth. Due to the substrate roughness contribution, a smoothing effect of initially rough surfaces could be observed. Also, surface roughness increased at a relatively low rate in the early growth time. The roughness exponent α and growth exponent β for Al films were determined to be 0.79±0.05 and 0.16±0.01, respectively. The observed substrate effect on the evolution of surface roughness was also discussed in terms of the competition between the substrate roughness contribution and the growth-induced roughening. |
| Databáze: | OpenAIRE |
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