Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films
| Autor: | V. R. Shayapov, Yu. M. Rumyantsev, A. G. Plekhanov, E. A. Maksimovskii, N. I. Fainer, A. N. Golubenko |
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| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Materials science Nanocomposite Silicon Analytical chemistry chemistry.chemical_element 02 engineering and technology Atmospheric temperature range 021001 nanoscience & nanotechnology 01 natural sciences Inorganic Chemistry chemistry Plasma-enhanced chemical vapor deposition 0103 physical sciences Materials Chemistry Deposition (phase transition) Physical and Theoretical Chemistry Fourier transform infrared spectroscopy 0210 nano-technology Spectroscopy Chemical decomposition |
| Zdroj: | Journal of Structural Chemistry. 58:119-125 |
| ISSN: | 1573-8779 0022-4766 |
| Popis: | Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiC x N y O z :H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy. |
| Databáze: | OpenAIRE |
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