Low-bias gate tunable terahertz plasmonic signatures in chemical vapour deposited graphene of varying grain size
| Autor: | Harvey E. Beere, Stephan Hofmann, Juraj Sibik, David A. Ritchie, Angadjit Singh, Varun S. Kamboj, J. Axel Zeitler, Yuan Ren, Philipp Braeuninger-Weimer, Piran R. Kidambi, D. S. Jessop |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Graphene Terahertz radiation business.industry Doping Physics::Optics Resonance 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Grain size law.invention law 0103 physical sciences Physics::Atomic and Molecular Clusters Optoelectronics Surface plasmon resonance 010306 general physics 0210 nano-technology business Graphene nanoribbons Plasmon |
| Zdroj: | Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX. |
| ISSN: | 0277-786X |
| Popis: | We report the characterization of centimeter sized graphene field-effect transistors with ionic gating which enables active frequency and amplitude modulation of terahertz (THz) radiation. Chemical vapour deposited graphene with different grain sizes were studied using THz time-domain spectroscopy. We demonstrate that the plasmonic resonances intrinsic to graphene can be tuned over a wide range of THz frequencies by engineering the grain size of the graphene. Further frequency tuning of the resonance, up to ~65 GHz, is achieved by electrostatic doping via ionic gating. These results present the first demonstration of tuning the intrinsic plasmonic resonances in graphene. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|