Hydrogen enhancement of silicon thermal donor formation

Autor:	D. J. James, C. D. Lamp
Rok vydání:	1993
Předmět:	Deep-level transient spectroscopy Physics and Astronomy (miscellaneous) Silicon Hydrogen Oxygene Analytical chemistry Mineralogy chemistry.chemical_element Crystallographic defect Oxygen chemistry Impurity Thermal computer computer.programming_language
Zdroj:	Applied Physics Letters. 62:2081-2083
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.109485
Popis:	Oxygen‐related thermal donor formation in Czochralski silicon is characterized by the capacitance‐voltage and deep level transient spectroscopy techniques as a function of 450 °C anneal time following hydrogenation. Increases in the formation rate and number of thermal donor (TD) defects found after hydrogenation are reported. This study finds an increase in TD+/++ concentration in the near‐surface region at short anneal times, but at longer times an elevated concentration was not observed. No acceleration through the sequence of thermal donor defects was detected. This fails to support the model of hydrogen lowering the barrier to oxygen diffusion and accelerating the TDn→TDn+1 transitions. This study does, however, support a model in which the hydrogen increases the available thermal donor core sites.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::50f6bc0e2b45ca6dce4153abaf8b1724 https://doi.org/10.1063/1.109485 Zobrazit plný text záznamu