Microfabrication of polytetrafluoroethylene using SR direct etching
| Autor: | Shigeaki Yamamoto, Yoshiaki Ukita, Kozo Mochiji, Yuichi Utsumi |
|---|---|
| Rok vydání: | 2011 |
| Předmět: |
Materials science
Polytetrafluoroethylene Fabrication business.industry Microfluidics Energy Engineering and Power Technology Nanotechnology Microstructure chemistry.chemical_compound Surface micromachining Semiconductor chemistry Etching (microfabrication) Electrical and Electronic Engineering business Microfabrication |
| Zdroj: | Electrical Engineering in Japan. 178:49-54 |
| ISSN: | 0424-7760 |
| DOI: | 10.1002/eej.21152 |
| Popis: | Polytetrafluoroethylene (PTFE) is a very attractive material for various fields because of its chemical resistance, insulation properties, and hydrophobic properties. However, it is difficult to fabricate PTFE microstructures with conventional techniques such as semiconductor processes or micromachining. We have succeeded in the fabrication of high-aspect-ratio microfluidics parts from PTFE by direct in-vacuum photo-etching utilizing synchrotron radiation (SR) at energy levels from 2 to 12 keV. This paper presents an analysis of the mechanisms of the PTFE microfabrication process and describes newly discovered processing characteristics of PTFE. © 2011 Wiley Periodicals, Inc. Electr Eng Jpn, 178(4): 49–54, 2012; Published online in Wiley Online Library (wileyonlinelibrary.com). DOI 10.1002/eej.21152 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text