Challenges to depth-of-focus enhancement with a practical super-resolution technique

Autor:	Koichi Takeuchi, Tatsuji Oda, Masaya Uematsu, Atsushi Sekiguchi, Tohru Ogawa
Rok vydání:	1996
Předmět:	Depth of focus Materials science Excimer laser business.industry medicine.medical_treatment Extreme ultraviolet lithography Phase (waves) law.invention Optics law medicine Optoelectronics X-ray lithography Photolithography Photomask business Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.240934
Popis:	A new technique, which combines weak quadrupole illumination and an attenuated phase- shifting mask, has been developed. 0.03 micrometers lithography with i-line can be performed with this technique. It is also confirmed that KrF excimer laser lithography is a powerful candidate for generating 0.18 micrometers -rule devices.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::50d52bc9538eb88b6cdc3593788b85f2 https://doi.org/10.1117/12.240934 Zobrazit plný text záznamu