Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
| Autor: | Diana K. LaFollette, Kinsey L. Canova, Zhejun V. Zhang, John R. Abelson |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science & Technology A. 40:023403 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/6.0001562 |
| Databáze: | OpenAIRE |
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