X-ray photoelectron spectroscopy analysis of organic materials etched by charged water droplet impact
| Autor: | Daiki Asakawa, Kenzo Hiraoka, Yoshitoki Iijima, Riou Takaishi, Yuji Sakai |
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| Rok vydání: | 2009 |
| Předmět: |
Spin coating
fungi technology industry and agriculture Analytical chemistry macromolecular substances Surfaces and Interfaces Condensed Matter Physics Mass spectrometry Surfaces Coatings and Films Secondary ion mass spectrometry chemistry.chemical_compound stomatognathic system chemistry X-ray photoelectron spectroscopy Etching (microfabrication) Mass spectrum Irradiation Polystyrene |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:743-747 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.3077283 |
| Popis: | Electrospray droplet impact (EDI) has been developed for matrix-free secondary ion mass spectrometry for surface analysis. When a target is etched by EDI, the physical etching on the target is suppressed to minimal, i.e., the occurrence of shallow surface etching. A novel approach to shallow surface etching of polystyrene (PS) by EDI was investigated. The charged water droplets were irradiated to a bulk and a spin coated PS. After irradiation, these samples were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy. It was found that XPS spectra for PS were independent on the irradiation time by EDI. This indicates that EDI is a unique technique for the surface etching of the organic materials without leaving any damage on the etched surface. |
| Databáze: | OpenAIRE |
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