Effect of growth and electrical properties of TiOx films on microbolometer design
Autor: | Monika Tomar, K. K. Jain, Sangeeta Lamba, Sudha Gupta, Vinay Gupta, Shankar Dutta, Isha Yadav, Ratnamala Chatterjee, Surbhi Jain |
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Rok vydání: | 2020 |
Předmět: |
010302 applied physics
Materials science Bolometer Analytical chemistry Microbolometer Substrate (electronics) Condensed Matter Physics 01 natural sciences Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Amorphous solid Volumetric flow rate law.invention Electrical resistivity and conductivity Sputtering law 0103 physical sciences Electrical and Electronic Engineering Thin film |
Zdroj: | Journal of Materials Science: Materials in Electronics. 31:6671-6678 |
ISSN: | 1573-482X 0957-4522 |
DOI: | 10.1007/s10854-020-03223-y |
Popis: | This paper presents the feasibility of non-stoichiometric TiOx thin films as an active material for bolometer application. The TiOx films have been deposited on glass substrate by DC sputtering with oxygen flow rate of 0.1–0.7 sccm at room temperature and their electrical properties have been studied. The TiOx films were found to be amorphous with dense and smooth surface morphology. The thickness of the films was found to decrease from 150 to 30 nm with an increase in oxygen flow rate. The TiOx film corresponding to 0.7 sccm showed maximum temperature coefficient of resistivity of 0.72%/°C. Performance of TiOx-based bolometer pixel (pitch: 56 μm) is simulated using the electrical characteristics of the deposited films. The TiOx film corresponding to the 0.7 sccm O2 flow rate displayed thermal conductance of 2.95 × 10–7 W/K along with a maximum Figure of Merit of 2.45 × 106 and a time constant of 8.2 ms. The Noise equivalent temperature difference of the bolometer structure is estimated (~ 107 mK). |
Databáze: | OpenAIRE |
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