Auto-Bias Electrical Variable Capacitor of Reduced Active Component Count and Voltage Stress for 13.56 MHz RF Plasma Process

Autor:	Juhwa Min, Yongsug Suh
Rok vydání:	2022
Předmět:	Control and Systems Engineering Electrical and Electronic Engineering Industrial and Manufacturing Engineering
Zdroj:	IEEE Transactions on Industry Applications. 58:4994-5004
ISSN:	1939-9367 0093-9994
DOI:	10.1109/tia.2022.3175466
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5029c961dae47f513ccdcbcb3fb17259 https://doi.org/10.1109/tia.2022.3175466 Zobrazit plný text záznamu