| Autor: |
Vlad Temchenko, Kevin Hewitt, Kim Kirkwood, Yahong Y.H. Qian, Chris Pawlowicz, Andrew Woodard, Christina Elliott, Tedeusz Bryskiewicz |
| Rok vydání: |
2003 |
| Předmět: |
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| Zdroj: |
Applications of Photonic Technology 6. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.543541 |
| Popis: |
We report a non-destructive in-line monitoring method developed for Cd diffusion into InP on SACM-APD structure. Photocurrent vs voltage measurement are taken directly via proving diffused diodes on a wafer. We demonstrate that there is linear correlation between punch-through voltages Vpt on the photo I-V curves and diffusion depth measured by SIMS and Polaron profiles. It has been established that Vpt can be extracted easily from I-V curves and used for re-diffusion to approach target depth. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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