Ultra Low-kFilms Derived from Hyperbranched Polycarbosilanes (HBPCS)

Autor:	Jitendra S. Rathore, Geraud Dubois, Leonard V. Interrante
Rok vydání:	2008
Předmět:	Biomaterials Materials science Chemical engineering Polymer chemistry Electrochemistry Dielectric Thin film Condensed Matter Physics Porosity Electronic Optical and Magnetic Materials
Zdroj:	Advanced Functional Materials. 18:4022-4028
ISSN:	1616-3028 1616-301X
DOI:	10.1002/adfm.200801197
Popis:	Dense and porous hyperbranched carbosiloxane thin films (HBCSO) are obtained by sol-gel processing using methylene-bridged hyperbranched polycarbosilanes (HBPCSs) with the general compositional formula {(OMe) 2 Si(CH 2 )). Introduction of porosity is achieved using a porogen templating approach, allowing the control of the films' dielectric constant from 2.9 to as low as 1.8. Over the entire dielectric range, the HBCSO films exhibit exceptional mechanical properties, 2-3 times superior to those obtained for non-alkylene bridged organosiloxanes such as methylsilsesquioxanes (MSSQs) of similar densities and k-values.
Databáze:	OpenAIRE
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