Charge Retention in a Patterned ${\rm SiO}_{2}/{\rm Si}_{3}{\rm N}_{4}$ Electret

Autor:	Chris Van Hoof, Vladimir Leonov, Rob van Schaijk
Rok vydání:	2013
Předmět:	Range (particle radiation) Materials science business.industry Electrical engineering Analytical chemistry Charge (physics) Line width Electret Electrical and Electronic Engineering business Instrumentation Layer (electronics) Charge retention Voltage Open air
Zdroj:	IEEE Sensors Journal. 13:3369-3376
ISSN:	1558-1748 1530-437X
DOI:	10.1109/jsen.2013.2263636
Popis:	The electret consisting of a Si3N4 pattern on a SiO2 layer is studied. A charge pattern on 1.3 μm-wide Si3N4 electret lines is successfully formed with a voltage of 80 V between charged pattern and substantially discharged SiO2. The method for making a charge pattern is optimized for reaching the highest voltage on narrow lines. A yearlong sample aging on open air shows that there is no dependence of charge retention on line width within the 1 cm-1.3 μm range. Considering the decay of surface potential during 1 year, the estimated charge lifetime in the patterned electret exceeds 75 years.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::50027bdd0dcb850a9fee22aa5a15aa28 https://doi.org/10.1109/jsen.2013.2263636 Zobrazit plný text záznamu