Coating of Highly Porous Fiber Matrices by Atomic Layer Deposition
| Autor: | Marianna Kemell, Sven Lindfors, Roland Groenen, Markku Leskelä, Mikko Ritala |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Materials science
Inorganic chemistry chemistry.chemical_element 02 engineering and technology engineering.material 010402 general chemistry 01 natural sciences 7. Clean energy Metal Atomic layer deposition Coating Atomic layer epitaxy Iridium Fiber Composite material Thin film Thermal oxidation Process Chemistry and Technology Surfaces and Interfaces General Chemistry 021001 nanoscience & nanotechnology 0104 chemical sciences chemistry visual_art visual_art.visual_art_medium engineering 0210 nano-technology |
| Zdroj: | Chemical Vapor Deposition. 14:347-352 |
| ISSN: | 1521-3862 0948-1907 |
| DOI: | 10.1002/cvde.200800710 |
| Popis: | The potential of atomic layer deposition (ALD) in the coating of highly porous, 0.5 mm thick, metal fiber matrices is explored. Three different reactor types are compared for ALD of Al2O3 thin films from trimethylaluminum and water. Both an evacuation-type and a flow-type process are successful in forming conformal Al2O3 coatings on the fibers. The coatings are able to protect the fibers against electrochemical corrosion and thermal oxidation. In addition, a metallic Ir thin film is deposited by ALD on one of the Al2O3-coated fiber matrices. This kind of a structure could be used, for example, as a catalytic filter. |
| Databáze: | OpenAIRE |
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