Template fabrication schemes for step and flash imprint lithography
| Autor: | K. Gehoski, M. Meissl, William J. Dauksher, D. J. Resnick, Sidlgata V. Sreenivasan, Eric S. Ainley, Matthew E. Colburn, Jeffrey H. Baker, Byung Jin Choi, David P. Mancini, Kevin J. Nordquist, John G. Ekerdt, Todd Bailey, Carlton G Willson, A. Alec Talin, S. Johnson |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
Fabrication Nanotechnology Overlay Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanolithography Flash (manufacturing) Wafer Electrical and Electronic Engineering Lithography Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. :461-467 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(02)00462-8 |
| Popis: | Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniques. The purpose of this work is to investigate alternative processes for defining features on an SFIL template. The first method considered using a much thinner ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect