Programmed symmetry lowering in 2D colloids
| Autor: | W J O'Sullivan, Yeke Tang, R C Mockler, R M Malzbender, J A Beall |
|---|---|
| Rok vydání: | 1987 |
| Předmět: |
Materials science
Plasma etching business.industry fungi technology industry and agriculture General Physics and Astronomy Statistical and Nonlinear Physics Aqueous suspension Molecular physics Symmetry (physics) Computer Science::Other Colloid Optics Electric field business Quartz Lithography Mathematical Physics Single layer |
| Zdroj: | Journal of Physics A: Mathematical and General. 20:L189-L192 |
| ISSN: | 1361-6447 0305-4470 |
| DOI: | 10.1088/0305-4470/20/3/013 |
| Popis: | The authors present a new experimental technique for producing model two-dimensional systems subject to external fields of arbitrary symmetry and variable coupling strength. An aqueous suspension of colloidal microspheres is confined to a single layer between two quartz flats, on one of which a pattern of eroded features is etched using electron-beam lithography combined with plasma etching. By varying the depth of the etched features the strength of the electrostatic wall-particle forces can be adjusted smoothly. They demonstrate the feasibility of the method and discuss possible applications. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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