Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit

Autor:	Kouichi Ono, Mutumi Tuda, Masakazu Taki, Keisuke Namba
Rok vydání:	1994
Předmět:	Chemistry General Engineering General Physics and Astronomy Plasma Sputter deposition equipment and supplies Electron cyclotron resonance Magnetic field Physics::Plasma Physics Sputtering Cavity magnetron Electron temperature Atomic physics Microwave
Zdroj:	Japanese Journal of Applied Physics. 33:1530
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.33.1530
Popis:	A new-type electron-cyclotron-resonance (ECR) plasma source has been developed for materials processing. The reactor employed magnetic multicusp fields and microwaves radially injected through an annular slit; this configuration yielded stable, uniform discharges without contamination of the microwave entrance window by sputtered particles. Electrostatic probe and optical emission measurements were made to obtain the plasma properties in Ar. These measurements showed that high-density, uniform plasmas were produced by optimizing the width of the annular slit. Moreover, the electron temperature exhibited its strong peak around the ECR zone near the chamber wall. A simple model indicates the mechanisms responsible for the plasma uniformity obtained: the plasma was dominantly produced around the ECR zone, and then diffused preferentially toward the center of the chamber because of strong magnetic fields generated near the wall surface.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4f6ffa989015933dce984be8a867020a https://doi.org/10.1143/jjap.33.1530 Zobrazit plný text záznamu