Nitriding of titanium in rarefied activated nitrogen

Autor:	I. N. Frantsevich, K. A. Safaryan, L. A. Grishnova, V.L. Tikush
Rok vydání:	1985
Předmět:	Materials science Annealing (metallurgy) Metallurgy Metals and Alloys chemistry.chemical_element Condensed Matter Physics Nitrogen chemistry Mechanics of Materials Metallic materials Materials Chemistry Ceramics and Composites Active nitrogen Surface layer Tin Nitriding Titanium
Zdroj:	Soviet Powder Metallurgy and Metal Ceramics. 24:905-907
ISSN:	1573-9066 0038-5735
Popis:	Use of an hf discharge enables the rate of nitriding of titanium to be increased and the physicomechanical characteristics of the surface layer to be improved. The reaction of active nitrogen with titanium comprises three stages: formation of a surface TiN film, growth in the latter's thickness with the simultaneous formation of an α-solid solution, and annealing of the TiN phase.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4f6ad7bc436fbd2236f7b8e3e68a1c09 https://doi.org/10.1007/bf00805243 Zobrazit plný text záznamu Full text from SpringerLink