| Autor: |
Michael Watts, P. Schumaker, Sidlgata V. Sreenivasan, Frank Y. Xu, Jessica Y. Choi, Daniel A. Babbs, Norman E. Schumaker, Van Nguyen, Ian M. Mcmackin |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference. |
| Popis: |
The Step and Flash/sup TM/ Imprint Lithography (S-FIL/sup TM/) process is a step and repeat nanoreplication technique based on UV curable low viscosity liquids. This article discusses various process capability of S-FIL including imprint resolution and line edge roughness; field-to-field CD control; imprinted film thickness uniformity; process life and defect data; and overlay alignment accuracy. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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