Isotopic exchange in hard amorphous carbonized layers

Autor:	D. Boutard, B.M.U. Scherzer, Wolfhard Möller
Rok vydání:	1990
Předmět:	Glow discharge Materials science Silicon chemistry Deuterium Hydrogen Analytical chemistry General Physics and Astronomy chemistry.chemical_element Carbon Fluence Amorphous solid Ion
Zdroj:	Journal of Applied Physics. 67:163-168
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.345296
Popis:	Hard amorphous films of a‐C:H and a‐C:D were deposited by a rf glow discharge in either CH4 or CD4 . By ion bombardment with protons and deuterons, the H/D exchange process was studied as function of the bombardment fluence by means of depth profile measurements. The local hydrogen and deuterium contents are not adding up to a constant ‘‘saturation’’ value: the local mixing model is not valid. Instead of that an initial depletion appears, which depends on the incident energy of the ions. At higher fluences, the total (H+D):C ratio tends to increase again, due to an increasing influence of the deposition process. This demonstrates a structural difference between a‐C:H films and hydrogen‐saturated layers of implanted carbon.
Databáze:	OpenAIRE
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